Arnost Reiser: search on Z-Library

The world's largest scientific articles store. 70,000,000+ articles for free.

Don't use scam websites

1

A New Design Principle for the Photoactive Components (PACs) of Dissolution Inhibition Resists

Jha, Salil, Reiser, Arnost, Šroubková, Libuše, Zahradník, Rudolf

Journal:

Year:

1998

Language:

english

File:

PDF, 108 KB

english, 1998

2

A Percolation View of Novolak Dissolution. 3. Dissolution Inhibition

Shih, Hsiao-Yi, Yeh, Tung-Feng, Reiser, Arnost, Dammel, Ralph R., Merrem, Hans J., Pawlowski, Gerhard

Journal:

Year:

1994

Language:

english

File:

PDF, 803 KB

english, 1994

3

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Photoresist materials: a historical perspective

Willson, C. Grant, Dammel, Ralph R., Reiser, Arnost, Fuller, Gene E.

Year:

1997

Language:

english

File:

PDF, 2.18 MB

english, 1997

4

Molecular Mechanism of the Water Vapor Treatment of Thermal Printing Plates

Reiser, Arnost, Barinov, Victor

Journal:

Journal of Imaging Science and Technology

Year:

2009

Language:

english

File:

PDF, 274 KB

english, 2009

5

Novolak-Diazochinon-Photoresiste: abbildende Systeme für den Computerchip

Prof. Dr. Arnost Reiser, Dr. Hsiao-Yi Shih, Dr. Tung-Feng Yeh, Dr. Jian-Ping Huang

Journal:

Angewandte Chemie

Year:

1996

Language:

german

File:

PDF, 1.28 MB

german, 1996

6

Novolak-Diazoquinone Resists: The Imaging Systems of the Computer Chip

Prof. Dr. Arnost Reiser, Dr. Hsiao-Yi Shih, Dr. Tung-Feng Yeh, Dr. Jian-Ping Huang

Journal:

Angewandte Chemie International Edition

Year:

1996

Language:

english

File:

PDF, 2.84 MB

english, 1996

7

The effect of metallization on singlet oxygen formation by azo dyes

Hilary M. Graves, Linda G. Johnston, Arnost Reiser

Journal:

Journal of Photochemistry and Photobiology A: Chemistry

Year:

1988

Language:

english

File:

PDF, 650 KB

english, 1988

8

The nitrene intermediate in the photo-formation of carbazole from 2-azidobiphenyl

Arnost Reiser, Hans Wagner, George Bowes

Journal:

Tetrahedron Letters

Year:

1966

Language:

english

File:

PDF, 232 KB

english, 1966

9

Optical techniques to characterize polymer systems, H. Bassler, ed., Elsevier, New York, 1989, 610 pp. Price: $178.00.

Journal:

Journal of Polymer Science Part C: Polymer Letters

Year:

1989

Language:

english

File:

PDF, 56 KB

english, 1989

10

On the photoreactivity of diacetylene containing thermoplastic block copolymers

Rong-Chang Liang, Arnost Reiser

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Year:

1987

Language:

english

File:

PDF, 761 KB

english, 1987

11

Reactant preordering in solid polymer matrices. 2. Effect of decoupling the reactant groups from the polymer backbone

Lin, Anshyang A., Chu, Chi Fung, Reiser, Arnost

Journal:

Year:

1990

Language:

english

File:

PDF, 564 KB

english, 1990

12

On the physical meaning of the Kwei equation for the glass transition temperature of polymer blends

Lin, Anshyang A., Kwei, T. K., Reiser, Arnost

Journal:

Year:

1989

Language:

english

File:

PDF, 873 KB

english, 1989

13

Length of Phenolic Strings in Dissolution Inhibition Resists

Han, Yu-Kai, Reiser, Arnost

Journal:

Year:

1998

Language:

english

File:

PDF, 107 KB

english, 1998

14

Percolation view of novolak dissolution and dissolution inhibition

Yeh, Tung Feng, Shih, Hsiao Yi, Reiser, Arnost

Journal:

Year:

1992

Language:

english

File:

PDF, 848 KB

english, 1992

15

Triplet energy migration in solid films of photoreactive polymers

Farid, Samir, Daly, Robert C., Moody, Roger E., Huang, Wei Yu, Reiser, Arnost

Journal:

Year:

1991

Language:

english

File:

PDF, 712 KB

english, 1991

16

Reactant preordering in solid polymer matrixes. 3. Triplet sensitized blends of donor-acceptor substituted poly(vinyl cinnamates)

Huang, Wei Yu, Lin, Anshyang A., Reiser, Arnost

Journal:

Year:

1991

Language:

english

File:

PDF, 561 KB

english, 1991

17

Percolation View of Novolak Dissolution. 6. The Acceleration of Novolak Dissolution by Phenolic Additives

Shih, Hsiao-Yi, Reiser, Arnost

Journal:

Year:

1997

Language:

english

File:

PDF, 159 KB

english, 1997

18

Percolation View of Novolak Dissolution. 5. The Dissolution of Exposed Resist Films

Shih, Hsiao-Yi, Reiser, Arnost

Journal:

Year:

1996

Language:

english

File:

PDF, 275 KB

english, 1996

19

Effect of Hydrogen Acceptors on p K a of Phenolic Resins: Link to Dissolution Inhibition

Yan, Zhenglin, Reiser, Arnost

Journal:

Year:

1998

Language:

english

File:

PDF, 108 KB

english, 1998

20

Percolation View of Novolak Dissolution. 7. The Effect of Salts

Kim, Myoung Soo, Reiser, Arnost

Journal:

Year:

1997

Language:

english

File:

PDF, 240 KB

english, 1997

21

Proton Delocalization and Hyperacidity in Some Phenolic Resins

Yan, Zhenglin, Yeh, Tung-Feng, Schmidling, David G., Reiser, Arnost, Mirau, Peter A., Šroubková, Libuše, Zahradník, Rudolf

Journal:

Year:

2001

Language:

english

File:

PDF, 99 KB

english, 2001

22

Percolation View of Novolak Dissolution. 10. Effect of Resin Molecular Weight

Shih, Hsiao-Yi, Zhuang, Huifang, Reiser, Arnost, Teraoka, Iwao, Goodman, Jonathan, Gallagher-Wetmore, Paula M.

Journal:

Year:

1998

Language:

english

File:

PDF, 132 KB

english, 1998

23

Correlation between negative charge on nitrogen and the reactivity of aromatic nitrenes

Reiser, Arnost., Leyshon, L.

Journal:

Journal of the American Chemical Society

Year:

1970

Language:

english

File:

PDF, 131 KB

english, 1970

24

Percolation View of Novolak Dissolution. 8. Effect of the Base Cation on Dissolution Rate

Shih, Hsiao-Yi, Reiser, Arnost

Journal:

Year:

1997

Language:

english

File:

PDF, 215 KB

english, 1997

25

Distribution of site reactivities in photoreactive amorphous solids

Pitts, Eric, Reiser, Arnost

Journal:

Journal of the American Chemical Society

Year:

1983

Language:

english

File:

PDF, 445 KB

english, 1983

26

On the crosslinking mechanism of benzophenone-containing polyimides

Lin, Anshyang A., Sastri, Vinod R., Tesoro, Giuliana, Reiser, Arnost, Eachus, Raymond

Journal:

Year:

1988

Language:

english

File:

PDF, 628 KB

english, 1988

27

Mechanism of the Trefonas Effect (Polyphotolysis) in Novolak−Diazonaphthoquinone Resists

Han, Yu-Kai, Yan, Zhenglin, Reiser, Arnost

Journal:

Year:

1999

Language:

english

File:

PDF, 90 KB

english, 1999

28

A Percolation View of Novolak Dissolution. 4. Mechanism of Inhibitor Action

Shih, Hsiao-Yi, Reiser, Arnost

Journal:

Year:

1995

Language:

english

File:

PDF, 668 KB

english, 1995

29

The dissolution of novolak in aqueous alkali

Huang, Jian Ping, Kwei, T. K., Reiser, Arnost

Journal:

Year:

1989

Language:

english

File:

PDF, 830 KB

english, 1989

30

Wavelength dependence of the photolysis of some anthracene-containing sulfonium salts

He, Xiaohua, Huang, Wei Yu, Reiser, Arnost

Journal:

Journal of Organic Chemistry

Year:

1992

Language:

english

File:

PDF, 461 KB

english, 1992

31

Chain Interpenetration in Solid Polymer Matrices: A Photochemical Approach

Reiser, Arnost, Egerton, Peter L.

Journal:

Year:

1979

Language:

english

File:

PDF, 491 KB

english, 1979

32

Photodecoupling of cross-links in polymeric gels

Li, Min Yu, Liang, Rong Chang, Reiser, Arnost

Journal:

Year:

1990

Language:

english

File:

PDF, 1.92 MB

english, 1990

33

Reactant preordering in solid polymer matrices: photocrosslinking in blends of donor- and acceptor-substituted poly(vinyl cinnamates)

Lin, Anshyang A., Reiser, Arnost

Journal:

Year:

1989

Language:

english

File:

PDF, 576 KB

english, 1989

34

Microphase formation in solutions of diacetylene-containing segmented block copolymers

Liang, Rong Chang, Lai, Wen Yih Frank, Reiser, Arnost

Journal:

Year:

1987

Language:

english

File:

PDF, 661 KB

english, 1987

35

A percolation view of novolak dissolution. 2. The statistics of a three-dimensional cubic percolation field and a generalized scaling law

Yeh, Tung Feng, Reiser, Arnost, Dammel, Ralph R., Pawlowski, Gerhard, Roeschert, Horst

Journal:

Year:

1993

Language:

english

File:

PDF, 777 KB

english, 1993

36

How complexing with a small number of transition metal ions can prevent dye fading

Journal:

Photochemical & Photobiological Sciences

Year:

2013

Language:

english

File:

PDF, 316 KB

english, 2013

37

Radiative and nonradiative transitions from the first excited singlet state of methyl-substituted naphthalenes

Journal:

The Journal of Chemical Physics

Year:

1973

Language:

english

File:

PDF, 312 KB

english, 1973

38

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Photoresist materials: a historical perspective

Willson, C. Grant, Dammel, Ralph R., Reiser, Arnost, Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 1.03 MB

english, 1997

39

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Emerging Lithographic Technologies - Photoresist materials: a historical perspective

Willson, C. Grant, Dammel, Ralph R., Reiser, Arnost, Seeger, David E.

Year:

1997

Language:

english

File:

PDF, 1.11 MB

english, 1997

40

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - New design principle for the PACs of novolak resists

Jha, Salil, Reiser, Arnost

Year:

1998

Language:

english

File:

PDF, 341 KB

english, 1998

41

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Effect of resin molecular weight on novolak dissolution

Shih, Hsiao-Yi, Zhuang, Huifang, Reiser, Arnost, Gallagher-Wetmore, Paula M.

Year:

1998

Language:

english

File:

PDF, 679 KB

english, 1998

42

Materials for Microlithography Edited by Thompson L.F., Willson C.G., and Frechet J.M.J. Volume 266 of ACS Symposium Series, American Chemical Society, 1984)

Journal:

Year:

1986

Language:

english

File:

PDF, 284 KB

english, 1986

43

Phase behavior and photoreactivity in diacetylene-containing block copolymers

Liang, Rong Chang, Lai, Wen Yih Frank, Reiser, Arnost

Journal:

Year:

1986

Language:

english

File:

PDF, 666 KB

english, 1986

44

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Percolation view of novolak dissolution: 3. dissolution inhibition

Shih, Hsiao-Yi, Yeh, Tung-Feng, Reiser, Arnost, Dammel, Ralph R., Merrem, Hans-Joachim, Pawlowski, Georg, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 437 KB

english, 1994

45

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Scaling law for the dissolution of phenolic resins in aqueous base

Yeh, Tung-Feng, Reiser, Arnost, Dammel, Ralph R., Pawlowski, Georg, Roeschert, Horst, Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 665 KB

english, 1993

46

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Interaction of novolak oligomers with hydrogen bond acceptors

Yeh, Tung-Feng, Huang, Jian P., Reiser, Arnost, Honda, Kenji, Beauchemin, Jr., Bernard T., Hurditch, Rodney J., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 563 KB

english, 1994

47

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Percolation view of novolak dissolution and dissolution inhibition

Yeh, Tung-Feng, Shih, Hsiao-Yi, Reiser, Arnost, Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 600 KB

english, 1992

48

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Dissolution promotion in novolac-diazoquinone resists

Shih, Hsiao-Yi, Reiser, Arnost, Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 216 KB

english, 1997

49

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Mechanism of dissolution inhibition in phenolic resins

Lin, Chen-Chy, Yeh, Tung-Feng, Reiser, Arnost, Honda, Kenji, Beauchemin, Jr., Bernard T., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 526 KB

english, 1993

50

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Mechanism of single-layer 193-nm dissolution inhibition resist

Yan, Zhenglin, Houlihan, Francis M., Reichmanis, Elsa, Nalamasu, Omkaram, Reiser, Arnost, Dabbagh, Gary, Hutton, Richard S., Osei, Dan, Sousa, Jose, Bolan, Kevin J., Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 289 KB

english, 2000

To build up a library is to create a life. It’s never just a random collection of books.

— Carlos María Domínguez

Official channel

Z-Library Desktop Launcher

Z-Library Since 2009 support@z-lib.do

EnglishРусскийEspañolItalianoελληνικάاللغة العربيةBahasa IndonesiaBahasa Malaysiaहिन्दीDeutschFrançaisPortuguêsУкраїнськаPolski中文繁體中文日本語Tiếng ViệtAzərbaycan DiliՀայոց լեզուภาษาไทยTürk Diliქართველიবাংলাپښتوతెలుగుاردو한국어SrpskiБългарски